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Range and damage distributions in ultra-low energy boron implantation into silicon

Hatzopoulos, N., Suder, S., Van den Berg, Jakob, Panknin, D., Fukarek, W., Donnelly, S. E., Cook, C.E.A., Armour, D.G., Lucassen, M., Frey, I., Foad, M.A., England, J.G., Moffatt, S., Bailey, Paul, Noakes, T.C. and Ohno, H. (1997) Range and damage distributions in ultra-low energy boron implantation into silicon. In: Ion implantation technology--96: proceedings of the Eleventh International Conference on Ion Implantation Technology. Institute of Electrical and Electronics Engineers, pp. 527-530. ISBN 9780780332898
Information
URI:
https://eprints.hud.ac.uk/id/eprint/14720
URI:
https://eprints.hud.ac.uk/id/eprint/14720
URI:
https://eprints.hud.ac.uk/id/eprint/14720
Title:
Range and damage distributions in ultra-low energy boron implantation into silicon
Creators:
Hatzopoulos, N., Suder, S., Van den Berg, Jakob, Panknin, D., Fukarek, W., Donnelly, S. E., Cook, C.E.A., Armour, D.G., Lucassen, M., Frey, I., Foad, M.A., England, J.G., Moffatt, S., Bailey, Paul, Noakes, T.C. and Ohno, H.
Editors:
Ishida, Emi
Date:
June 1997
Subjects:
Q Science > Q Science (General)
Q Science > QC Physics
Schools:
School of Applied Sciences
School of Computing and Engineering > Electron Microscopy and Materials Analysis
Library
Item Type:
Book Chapter
Depositing User:
Sharon Beastall
Date Deposited:
06 Sep 2012 08:39
Revision:
18
Last Modified:
28 Aug 2021 11:20
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