Chemical and optical profiling of ultra thin high-k dielectrics on silicon

Bernardini, S., MacKenzie, M., Buiu, O., Bailey, Paul, Noakes, T.C.Q., Davey, W.M., Hamilton, B. and Hall, S. (2008) Chemical and optical profiling of ultra thin high-k dielectrics on silicon. Thin Solid Films, 517 (1). pp. 459-461. ISSN 0040-6090

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Abstract

The thickness of HfO2 and hafnium silicate HfxSi1 − xOy thin films with a range of compositions are investigated using three complementary analytical techniques. We compare results obtained from Medium Energy Ion Scattering spectroscopy, spectroellipsometry and high-resolution Transmission Electron Microscopy. Our results demonstrate that the thickness of the silicate layers decreases with the Hf content

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URI:

https://eprints.hud.ac.uk/id/eprint/12447

URI:

https://eprints.hud.ac.uk/id/eprint/12447

Title:

Chemical and optical profiling of ultra thin high-k dielectrics on silicon

Creators:

Bernardini, S., MacKenzie, M., Buiu, O., Bailey, Paul, Noakes, T.C.Q., Davey, W.M., Hamilton, B. and Hall, S.

Identification Number:

https://doi.org/10.1016/j.tsf.2008.08.048

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