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Pattern analysis and metrology: the extraction of stable features from observable measurements

Scott, Paul J. (2004) Pattern analysis and metrology: the extraction of stable features from observable measurements. Proceedings of the Royal Society, A, 460. pp. 2845-2864. ISSN 1364-5021

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To extract patterns from observable measurements we need to be able to define and identify stable features in observable measurements that persist in the presence of small artificial features such as noise, measurement errors, etc. The representational theory of measurement is used to define the stability of a measurement procedure. A technique, 'motif analysis', is defined to identify and remove 'insignificant' features while leaving 'significant' features. This technique is formalized and three properties identified that ensure stability. The connection of motif analysis with morphological closing filters is established and used to prove the stability of motif analysis. Finally, a practical metrology example is given of motif analysis in surface texture. Here motif analysis is used to segment a surface into its significant features.

Item Type: Article
Additional Information: UoA 25 (General Engineering) © 2004 The Royal Society
Subjects: T Technology > TA Engineering (General). Civil engineering (General)
Schools: School of Computing and Engineering
School of Computing and Engineering > Centre for Precision Technologies
School of Computing and Engineering > Centre for Precision Technologies > Surface Metrology Group
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Depositing User: Briony Heyhoe
Date Deposited: 03 Oct 2007
Last Modified: 28 Aug 2021 23:29


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