A dual-source low-energy mass-analysed ion beam system for semiconductor epitaxy and novel materials growth

A dual-source mass-analysed low-energy ion beam system, intended for investigations into novel materials deposition and epitaxial layer growth, is described. The investigations require that uniform ion beams of useful flux and area, with an energy range reaching below damage thresholds, can be delivered into an ultrahigh vacuum target environment. The system described has been designed to provide 100 μA cm−2 beams of a wide range of species, fast switching between different species, and energies down to 10 eV and below.