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A new technique for the measurement of implanted He profiles in nickel

Donnelly, S. E., Whitmell, D. S. and Nelson, R. S. (1977) A new technique for the measurement of implanted He profiles in nickel. Radiation Effects, 33 (3). pp. 145-148. ISSN 0033-7579

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A new technique of measuring the range of helium ions implanted at low concentrations into nickel is described. The residual amount of helium in a foil is measured by a combination of gas release and selective vibro-polishing. The method, illustrated by the results of some preliminary experiments, is sufficiently sensitive to enable the range, to be measured with peak implanted gas concentrations of the order of 10−7 atoms per nickel atom (i.e. a sensitivity limit of 10−8 atom/atom) where bubble formation is unlikely. The mean projected range of 100 keV helium ions in nickel was found to be 2800 Å, together with a second peak at 5250 Å which is thought to be due to channelling. A significant fraction of the helium diffused interstitially to depths greater than 1 μm.

Item Type: Article
Subjects: Q Science > QC Physics
Schools: School of Computing and Engineering > Electron Microscopy and Materials Analysis
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Depositing User: Graeme Greaves
Date Deposited: 02 Oct 2013 07:53
Last Modified: 28 Aug 2021 11:32


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