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In situ transmission electron microscopy studies of radiation damage in copper indium diselenide

Donnelly, S. E., Hinks, J. A., Edmondson, P.D., Pilkington, R.D., Yakushev, M. and Birtcher, R.C. (2006) In situ transmission electron microscopy studies of radiation damage in copper indium diselenide. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 242 (1-2). pp. 686-689. ISSN 0168583X

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The ternary semiconductor, CuInSe2 (CIS), is a promising semiconductor material for use in photovoltaic applications. Of particular interest is the high tolerance of this material to bombardment by energetic particles. This is of particular importance for photovoltaic applications in outer space where the lifetime of CIS-based solar cells has been found to be at least 50 times that of those based on amorphous silicon. In this paper we report on studies of the build-up of radiation damage in CIS during irradiation with Xe ions in the energy range 100–400 keV. Room temperature experiments indicate that dynamic annealing processes prevent the build-up of high levels of damage. However, for irradiation at a temperature of 50 K, the behaviour changes drastically with the material amorphising at low fluences. This effect is discussed in terms of defect mobility.

Item Type: Article
Subjects: Q Science > Q Science (General)
Q Science > QC Physics
Schools: School of Computing and Engineering
School of Computing and Engineering > Electron Microscopy and Materials Analysis
Depositing User: Jonathan Hinks
Date Deposited: 29 Nov 2012 10:40
Last Modified: 28 Aug 2021 11:24


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