Bernardini, S., MacKenzie, M., Buiu, O., Bailey, Paul, Noakes, T.C.Q., Davey, W.M., Hamilton, B. and Hall, S. (2008) Chemical and optical profiling of ultra thin high-k dielectrics on silicon. Thin Solid Films, 517 (1). pp. 459-461. ISSN 0040-6090Metadata only available from this repository.
The thickness of HfO2 and hafnium silicate HfxSi1 − xOy thin films with a range of compositions are investigated using three complementary analytical techniques. We compare results obtained from Medium Energy Ion Scattering spectroscopy, spectroellipsometry and high-resolution Transmission Electron Microscopy. Our results demonstrate that the thickness of the silicate layers decreases with the Hf content
|Subjects:||Q Science > QC Physics|
|Schools:||School of Applied Sciences|
|Depositing User:||Sharon Beastall|
|Date Deposited:||10 Jan 2012 11:00|
|Last Modified:||04 Sep 2012 09:50|
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