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Items where Author is Colligon, John

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Number of items: 6.

2015

Colligon, John and Vishnyakov, Vladimir (2015) Applications of Energy-Assistance to the formation of novel surface coatings. Innovation into Success (17). pp. 65-68.

2014

Vishnyakov, Vladimir, Crisan, O., Dobrosz, P. and Colligon, John (2014) Ion sputter-deposition and in-air crystallisation of Cr2AlC films. Vacuum, 100. pp. 61-65. ISSN 0042-207X

2013

Vishnyakov, Vladimir, Lu, J., Eklund, P., Hultman, L. and Colligon, John (2013) Ti3SiC2-formation during Ti–C–Si multilayer deposition by magnetron sputtering at 650 °C. Vacuum, 93. pp. 56-59. ISSN 0042-207X

2011

Vishnyakov, V.M., Ehiasarian, A.P., Vishnyakov, Vladimir, Hovsepian, P. and Colligon, John (2011) Amorphous Boron containing silicon carbo-nitrides created by ion sputtering. Surface and Coatings Technology, 206 (1). pp. 149-154. ISSN 0257-8972

2005

Colligon, John, Vishnyakov, Vladimir, Valizadeh, R., Donnelly, S. E. and Kumashiro, S. (2005) Study of nanocrystalline TiN/Si3N4 thin films deposited using a dual ion beam method. Thin Solid Films, 485 (1-2). pp. 148-154. ISSN 0040-6090

1994

Valizadeh, R., Colligon, John, Donnelly, S. E., Faunce, C.A., Park, D. and Kheyrandish, H. (1994) Composition and Structure of Zirconium Nitride Films Produced by Ion Assisted Deposition. MRS Proceedings, 354. ISSN 1946-4274

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