Holdsworth, R. J., Martin, P.A., Raisbeck, D., Rivero, J., Sanders, H.E., Sheel, D. and Pemble, M.E. (2001) Time-Resolved In-Situ Spectroscopic Monitoring of the CVD of Tin Oxide onto a Glass Substrate. Chemical Vapor Deposition, 7 (1). pp. 39-43. ISSN 09481907

Near-infrared diode laser absorption spectroscopy has been demonstrated as an in-situ, non-invasive probe for use with a CVD reactor. The technique has been applied to the CVD of tin oxide onto a glass substrate, and by monitoring the evolution of methane in the reactor, it has been shown that the concentration of methane is correlated with the deposition rate of the tin oxide film. This illustrates the powerful possibilities for monitoring thin film production and properties, in-situ, during deposition.

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