Van den Berg, Jakob, Armour, D. G., Zhang, S., Whelan, S., Ohno, H., Wang, T.-S., Cullis, A. G., Collart, E. H. J., Goldberg, R. D., Bailey, Paul and Noakes, T. C. Q. (2002) Characterization by medium energy ion scattering of damage and dopant profiles produced by ultrashallow B and As implants into Si at different temperatures. Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, 20 (3). p. 974. ISSN 0734-211X
Add to AnyAdd to TwitterAdd to FacebookAdd to LinkedinAdd to PinterestAdd to Email