Search:
Computing and Library Services - delivering an inspiring information environment

Adjustable plane mirror interferometer adapted for microelectronic mask with different thickness

Yun, J., Lin, D., Liu, Z., Yin, C. and Hou, W. (2005) Adjustable plane mirror interferometer adapted for microelectronic mask with different thickness. Journal of Physics: conference series, 13. pp. 414-417. ISSN 1742-6596

Metadata only available from this repository.

Abstract

Plane mirror interferometers are usually utilized to nano-position large-range scanning stage in microelectronic mask measurement systems. To avoid Abbe-error the centerline of measurement light beams of X Y Z should be intersected at the upper surface of the mask. But the different thickness of masks can also lead to Abbé errors. In this paper a novel plane mirror interferometer is designed, in which the measurement centerline can be accurately adjusted in coincidence with the upper surface of the mask according to their different thickness. The Abbé arm of this interferometer can be decreased to zero and the Abbe-error is avoided completely. The range of different thickness that can be adapted in this interferometer is ±3 mm. In this paper a quadrant photoelectric cell adapter is used to measure the centerline of the measurement light beams and the uncertainty of this method is better than 0.02 mm, which can meet the needs of nano-positioning of microelectronic mask measurement.

Item Type: Article
Subjects: T Technology > T Technology (General)
T Technology > TA Engineering (General). Civil engineering (General)
Schools: School of Computing and Engineering
References:

1] Kim D, S Kim, H J Kong and Y Lee 2002 Measurement of the thickness profile of a transparent thin film deposited upon a pattern structure with an acousto-optic tunable filter Opt. Lett. 27 1893-95
CrossRef Link | Inspec Abstract | PubMed Abstract | Order from Infotrieve
[2] Kim S-W and G-H Kim 1999 Thickness-profile measurement of transparent thin-film layers by white-light scanning interferometry Appl. Opt. 38 5968-73
Inspec Abstract | Order from Infotrieve
[3] Clayton Teague E 1989 The National Institute of Standard Technology molecular measuring machine project: metroloty and precision engineering design J. Vac. Sci. Technol. B 7 (6) 1898-84
CrossRef Link | Inspec Abstract | Order from Infotrieve
[4] W Hassler-Grohne and H Bosse 1999 Characterisation of the long-term reproducibility of 2D coordinate photomask calibration at the PTB 1st International Conference and General Meeting of the European Soc. Precis. Eng. & Nanotechnol., Precision Engineering 2 446-449 Nanotechnology
Order from Infotrieve
[5] Lin D, J Yan, Z Chao, H Jiang, C Yin 2002 Phasemeter with externally trigger applied for PZT modulated interferometer Int. J. Electron. 89 (10) 759-69
CrossRef Link | Inspec Abstract | Order from Infotrieve

Depositing User: Briony Heyhoe
Date Deposited: 11 Apr 2008 15:24
Last Modified: 22 Oct 2008 14:20
URI: http://eprints.hud.ac.uk/id/eprint/657

Item control for Repository Staff only:

View Item

University of Huddersfield, Queensgate, Huddersfield, HD1 3DH Copyright and Disclaimer All rights reserved ©