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Medium energy ion scattering for the high depth resolution characterisation of high-k dielectric layers of nanometer thickness

Van den Berg, Jakob, Reading, M.A., Bailey, P., Noakes, T.Q.C., Adelmann, C., Popovici, M., Tielens, H., Conard, T., de Gendt, S. and van Elshocht, S. (2013) Medium energy ion scattering for the high depth resolution characterisation of high-k dielectric layers of nanometer thickness. Applied Surface Science, 281. pp. 8-16. ISSN 0169-4332

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Medium energy ion scattering (MEIS) using, typically, 100–200 keV H+ or He+ ions derives it ability to characterise nanolayers from the fact that the energy after backscattering depends (i) on the elastic energy loss suffered in a single collision with a target atom and (ii) on the inelastic energy losses on its incoming and outgoing trajectories. From the former the mass of the atom can be determined and from the latter its depth. Thus MEIS yields depth dependent compositional and structural information, with high depth resolution (sub-nm near the surface) and good sensitivity for all but the lighter masses. It is particularly well suited for the depth analysis of high-k multilayers of nanometer thickness. Accurate quantification of the depth distributions of atomic species can be obtained using suitable spectrum simulation.

In the present paper, important aspects of MEIS including quantification, depth resolution and spectrum simulation are briefly discussed. The capabilities of the technique in terms of the high depth resolution layer compositional and structural information it yields, is illustrated with reference to the detailed characterisation of a range of high-k nanolayer and multilayer structures for current microelectronic devices or those still under development: (i) HfO2 and HfSiOx for gate dielectric applications, including a TiN/Al2O3/HfO2/SiO2/Si structure, (ii) TiN/SrTiO3/TiN and (iii) TiO2/Ru/TiN multilayer structures for metal–insulator–metal capacitors (MIMcaps) in DRAM applications.

The unique information provided by the technique is highlighted by its clear capability to accurately quantify the composition profiles and thickness of nanolayers and complex multilayers as grown, and to identify the nature and extent of atom redistribution (e.g. intermixing, segregation) during layer deposition, annealing and plasma processing. The ability makes it a valuable tool in the development of the nanostructures that will become increasingly important as device dimensions continue to be scaled down.

Item Type: Article
Additional Information: NOTICE: this is the author’s version of a work that was accepted for publication in Applied Surface Science. Changes resulting from the publishing process, such as peer review, editing, corrections, structural formatting, and other quality control mechanisms may not be reflected in this document. Changes may have been made to this work since it was submitted for publication. A definitive version was subsequently published in
Subjects: Q Science > Q Science (General)
Q Science > QC Physics
Schools: School of Applied Sciences
Related URLs:
Depositing User: Sara Taylor
Date Deposited: 28 Feb 2013 11:43
Last Modified: 30 Nov 2015 19:26


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