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The interaction between Xe and F in Si (100) pre-amorphised with 20keV Xe and implanted with low energy BF2

Werner, M., Van den Berg, Jakob, Armour, D.G., Carter, G., Feudel, T., Herden, M., Bersani, M., Giubertoni, D., Bailey, Paul and Noakes, T.C.Q. (2004) The interaction between Xe and F in Si (100) pre-amorphised with 20keV Xe and implanted with low energy BF2. Materials Science and Engineering: B, 114-11. pp. 198-202. ISSN 0921-5107

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Abstract

The pre-amorphisation of Si by Xe+ ions, before source/drain and extension implants, is an attractive alternative to Ge+ or Si+, as it produces sharper amorphous/crystalline interfaces. Si (1 0 0) samples pre-amorphised with 20 keV Xe+ to a nominal dose of 2E14 cm−2 were implanted with 1 and 3 keV BF2+ to doses of 7E14 cm−2. Samples were annealed at temperatures ranging from 600 to 1130 °C and investigated by medium energy ion scattering (MEIS) and secondary ion mass spectrometry (SIMS). Following annealing, it was observed that implanted Xe has interacted with F originating from the BF2+ implant. MEIS studies showed that for all annealing conditions, approximately half of the Xe accumulated at depths of 7 nm for the 1 keV and at 13 nm for the 3 keV BF2+ implant. This equates to the end of range of B and F within the amorphous Si. SIMS showed that in the pre-amorphised samples, approximately 10% of the F migrates into the bulk and is trapped at the same depth in a ∼1:1 ratio to Xe. A small fraction of the implanted B is also trapped. The effect is interpreted in terms of the formation of a defect structure within the amorphised Si, leading to F stabilised Xe bubble or XeF compound formation.

Item Type: Article
Subjects: Q Science > Q Science (General)
Q Science > QC Physics
Schools: School of Applied Sciences
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Depositing User: Sharon Beastall
Date Deposited: 12 Sep 2012 09:25
Last Modified: 13 Sep 2012 09:58
URI: http://eprints.hud.ac.uk/id/eprint/14838

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