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Medium energy ion scattering for the characterisation of damage profiles of ultra shallow B implants in Si

Van den Berg, Jakob, Zhang, S, Whelan, S, Armour, D.G, Goldberg, R.D, Bailey, Paul and Noakes, T.C.Q (2001) Medium energy ion scattering for the characterisation of damage profiles of ultra shallow B implants in Si. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 183 (1-2). pp. 154-165. ISSN 0168-583X

Metadata only available from this repository.
Item Type: Article
Subjects: Q Science > Q Science (General)
Q Science > QC Physics
Schools: School of Applied Sciences
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Depositing User: Sharon Beastall
Date Deposited: 11 Sep 2012 10:34
Last Modified: 13 Sep 2012 10:01
URI: http://eprints.hud.ac.uk/id/eprint/14789

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