Medium energy ion scattering for the characterisation of damage profiles of ultra shallow B implants in Si

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Van den Berg, Jakob, Zhang, S, Whelan, S, Armour, D.G, Goldberg, R.D, Bailey, Paul and Noakes, T.C.Q (2001) Medium energy ion scattering for the characterisation of damage profiles of ultra shallow B implants in Si. Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms, 183 (1-2). pp. 154-165. ISSN 0168-583X

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Official URL: http://dx.doi.org/10.1016/S0168-583X(00)00683-2

DOI: 10.1016/S0168-583X(00)00683-2

Item Type:	Article
Subjects:	Q Science > Q Science (General) Q Science > QC Physics
Schools:	School of Applied Sciences
Related URLs:	Author Author
Depositing User:	Sharon Beastall
Date Deposited:	11 Sep 2012 10:34
Last Modified:	13 Sep 2012 10:01
URI:	http://eprints.hud.ac.uk/id/eprint/14789

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