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Higher-order suppression in diffraction-grating monochromators using thin films

Quinn, F. M., Teehan, D., MacDonald, M., Downes, S. and Bailey, Paul (1998) Higher-order suppression in diffraction-grating monochromators using thin films. Journal of Synchrotron Radiation, 5 (3). pp. 783-785. ISSN 0909-0495

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Abstract

Although a continuously tuneable source of photons is a very desirable feature of synchrotron radiation it has one main drawback: the contamination of the photon beam by higher-order diffracted light. Several elements have absorption edges which lie between 10 and 200 eV, a range prone to high second- and third-order content in XUV monochromators. They can, therefore, be used as transmission filters to reduce this higher-order content. This paper describes the use of thin filters to reduce the higher-order content in diffraction-grating monochromators. Their suppression efficiency, transmission and ageing have been characterized using photoelectron spectroscopy and compared with calculated values. The effect of oxide contamination on their performance has been assessed. Filters are now installed on eight XUV beamlines and have been in routine use for several years.

Item Type: Article
Subjects: Q Science > Q Science (General)
Q Science > QC Physics
Schools: School of Applied Sciences
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Depositing User: Sharon Beastall
Date Deposited: 06 Sep 2012 10:44
Last Modified: 06 Sep 2012 10:44
URI: http://eprints.hud.ac.uk/id/eprint/14729

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