Range and damage distributions in ultra-low energy boron implantation into silicon

Hatzopoulos, N., Suder, S., Van den Berg, Jakob, Panknin, D., Fukarek, W., Donnelly, S. E., Cook, C.E.A., Armour, D.G., Lucassen, M., Frey, I., Foad, M.A., England, J.G., Moffatt, S., Bailey, Paul, Noakes, T.C. and Ohno, H. (1997) Range and damage distributions in ultra-low energy boron implantation into silicon. In: Ion implantation technology--96: proceedings of the Eleventh International Conference on Ion Implantation Technology. Institute of Electrical and Electronics Engineers, pp. 527-530. ISBN 9780780332898

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