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Formation of barrier-type anodic films on sputtering-deposited Al–Ti alloys

Nettikaden, V.C., Baron-Wiecheć, A., Bailey, Paul, Noakes, T.C.Q., Skeldon, P. and Thompson, G.E. (2010) Formation of barrier-type anodic films on sputtering-deposited Al–Ti alloys. Corrosion Science, 52 (11). pp. 3717-3724. ISSN 0010-938X

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Abstract

The formation of amorphous anodic films at constant current is investigated for sputtering-deposited Al–Ti alloys containing from 3–30 at.% Ti. The films were grown at high efficiency in a borate electrolyte and comprised a main region containing units of Al2O3 and TiO2, with a thin surface region enriched in titanium species. The formation ratios of the films increased with increase of titanium content of the alloys. The presence of the outer region is explained by the faster migration of Ti4+ ions relative to that of Al3+ ions through the films.

Item Type: Article
Subjects: Q Science > QC Physics
Schools: School of Applied Sciences
Depositing User: Sharon Beastall
Date Deposited: 11 Jan 2012 11:10
Last Modified: 04 Sep 2012 09:41
URI: http://eprints.hud.ac.uk/id/eprint/12480

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